diff --git a/process_implementations/hkust/repetitive_steps.yaml b/process_implementations/hkust/repetitive_steps.yaml
index 60e3724776d1f1c2c509674b7a2285856bf786de..998761d7f223ddabcdb1000818bc7aaf6156cfd3 100644
--- a/process_implementations/hkust/repetitive_steps.yaml
+++ b/process_implementations/hkust/repetitive_steps.yaml
@@ -2,7 +2,7 @@ implant_exposure: [
         {
                 equipment: PHT-T1,
                 process: "HMDS, PR coating, soft bake",
-                requirement: "FH 6400L: 3krpm ( $\\approx$1.5\\um ), soft bake: 110\\degreesC 1min",
+                requirement: "FH 6400L: 3krpm ( $\\approx$1.5\\um ), soft bake: 110\\degreesC 1 minute",
         },
         {
                 equipment: PHT-S1,
@@ -12,7 +12,7 @@ implant_exposure: [
         {
                 equipment: PHT-T2,
                 process: "Develop, Hard bake",
-                requirement: "FHD-5, 1min; hard bake: 120\\degreesC, 30min",
+                requirement: "FHD-5, 1min; hard bake: 120\\degreesC, 30 minutes",
         },
 ]
 
@@ -20,7 +20,7 @@ normal_exposure: [
         {
                 equipment: PHT-T1,
                 process: "HMDS, PR coating, soft bake",
-                requirement: "HPR 504: 3krpm ( $\\approx$1.5\\um ), soft bake: 110\\degreesC 1min",
+                requirement: "HPR 504: 3krpm ( $\\approx$1.5\\um ), soft bake: 110\\degreesC 1 minute",
         },
         {
                 equipment: PHT-S1,
@@ -30,7 +30,7 @@ normal_exposure: [
         {
                 equipment: PHT-T2,
                 process: "Develop, Hard bake",
-                requirement: "FHD-5, 1min; hard bake: 120\\degreesC, 30 min",
+                requirement: "FHD-5, 1min; hard bake: 120\\degreesC, 30 minutes",
         },
 ]
 
@@ -40,12 +40,12 @@ initial_clean_A: [
         {
                 equipment: WET-A3,
                 process: "Initial Cleaning",
-                requirement: "H2SO4+H2O2, 10mins @ 120\\degreesC",
+                requirement: "H2SO4+H2O2, 10 minutes @ 120\\degreesC",
         },
         {
                 equipment: WET-A2,
                 process: "HF dip",
-                requirement: "1 min",
+                requirement: "1 minute",
         },
         {
                 equipment: SRD-A,
diff --git a/process_implementations/hkust/steps_dry.pdf b/process_implementations/hkust/steps_dry.pdf
index a7e7c835a310c8e3cc12cb01850d055c8f128b70..e277cdebd51526e2f3dc23b9305f8e420504b7a7 100644
Binary files a/process_implementations/hkust/steps_dry.pdf and b/process_implementations/hkust/steps_dry.pdf differ
diff --git a/process_implementations/hkust/steps_dry.yaml b/process_implementations/hkust/steps_dry.yaml
index 062d06ba12ed301f718b0bdc46f811756912ea46..947c0848f097a134bdefd1fd159da7ecad9bf291 100644
--- a/process_implementations/hkust/steps_dry.yaml
+++ b/process_implementations/hkust/steps_dry.yaml
@@ -48,13 +48,13 @@
                 },
                 {
                         equipment: CMP-1,
-                        process: "Planarize oxide",
-                        requirement: "10 minutes",
+                        process: "Semi-Sperse 25-E",
+                        requirement: "10 minutes, PT rpm: 40, chuck rpm: 25, back pressure: 2 psi",
                 },
                 {
                         equipment: WET-G1,
                         process: "Ammonium cleaning",
-                        requirement: "70\\degreesC, 10mins",
+                        requirement: "70\\degreesC, 10 minutes",
                 },
                 {
                         equipment: WET-C1,
@@ -243,7 +243,7 @@
                 {
                         equipment: WET-E4,
                         process: "Sulfuric resist strip",
-                        requirement: "H2SO4+H2O2, 120\\degreesC, 10mins",
+                        requirement: "H2SO4+H2O2, 120\\degreesC, 10 minutes",
                 },
         ],
 }
@@ -302,7 +302,7 @@
                 {
                         equipment: WET-E4,
                         process: "Sulfuric resist strip",
-                        requirement: "H2SO4+H2O2, 120\\degreesC, 10mins",
+                        requirement: "H2SO4+H2O2, 120\\degreesC, 10 minutes",
                 },
                 {
                         equipment: SPT-NSC3000,
@@ -350,12 +350,12 @@
                 {
                         equipment: DRY-RIE-2,
                         process: "CHF3 etch",
-                        requirement: "180 seconds",
+                        requirement: "360 seconds",
                 },
                 {
                         equipment: WET-Y1,
                         process: "Resist strip",
-                        requirement: "10mins",
+                        requirement: "10 minutes",
                 },
         ],
 }
@@ -372,13 +372,13 @@
                 normal_exposure,
                 {
                         equipment: DRY-Metal-1,
-                        process: "Wire formation",
-                        requirement: "200 nm",
+                        process: "Ni-682",
+                        requirement: "3 minutes",
                 },
                 {
                         equipment: WET-Y1,
                         process: "Resist strip",
-                        requirement: "10mins",
+                        requirement: "10 minutes",
                 },
         ],
 }
@@ -411,12 +411,12 @@
                 {
                         equipment: DRY-RIE-2,
                         process: "CHF3 etch",
-                        requirement: "180 seconds",
+                        requirement: "360 seconds",
                 },
                 {
                         equipment: WET-Y1,
                         process: "Resist strip",
-                        requirement: "10mins",
+                        requirement: "10 minutes",
                 },
         ],
 }
@@ -433,13 +433,13 @@
                 normal_exposure,
                 {
                         equipment: DRY-Metal-1,
-                        process: "Wire formation",
-                        requirement: "150 nm",
+                        process: "Ni-682",
+                        requirement: "2 minutes",
                 },
                 {
                         equipment: WET-Y1,
                         process: "Resist strip",
-                        requirement: "10mins",
+                        requirement: "10 minutes",
                 },
         ],
 }
@@ -472,12 +472,12 @@
                 {
                         equipment: DRY-RIE-2,
                         process: "CHF3 etch",
-                        requirement: "180 seconds",
+                        requirement: "360 seconds",
                 },
                 {
                         equipment: WET-Y1,
                         process: "Resist strip",
-                        requirement: "10mins",
+                        requirement: "10 minutes",
                 },
         ],
 }
@@ -494,13 +494,13 @@
                 normal_exposure,
                 {
                         equipment: DRY-Metal-1,
-                        process: "Wire formation",
-                        requirement: "150 nm",
+                        process: "Ni-682",
+                        requirement: "2 minutes",
                 },
                 {
                         equipment: WET-Y1,
                         process: "Resist strip",
-                        requirement: "10mins",
+                        requirement: "10 minutes",
                 },
         ],
 }
@@ -533,12 +533,12 @@
                 {
                         equipment: DRY-RIE-2,
                         process: "CHF3 etch",
-                        requirement: "180 seconds",
+                        requirement: "360 seconds",
                 },
                 {
                         equipment: WET-Y1,
                         process: "Resist strip",
-                        requirement: "10mins",
+                        requirement: "10 minutes",
                 },
         ],
 }
diff --git a/process_implementations/hkust/steps_wet.pdf b/process_implementations/hkust/steps_wet.pdf
index 5e7d74d683c611678d7f681470d9782e45aae74f..dba62d19c4bcb23d424a99ff27c269a46f2e9434 100644
Binary files a/process_implementations/hkust/steps_wet.pdf and b/process_implementations/hkust/steps_wet.pdf differ